High-κ dielectric (HfO2)/2D Semiconductor (HfSe2) Gate Stack for Low-P…
| 2024-03-26 | |
| Taeho Kang, Joonho Park, Hanggyo Jung, Haeju Choi, Sang-Min Lee, Nayeong Lee, Ryong-Gyu Lee, Gahye Kim, Seung-Hwan Kim, Hyung-jun Kim, Cheol-Woong Yang, Jongwook Jeon, Yong-Hoon Kim, Sungjoo Lee | |
| Advanced Materials | |
| 29.4 | |
| 10.1002/adma.202312747 |
관련링크
본문
-